In the field of semiconductor manufacturing, photoresist is a crucial material, especially in advanced EUV (Extreme Ultraviolet Lithography) technology, whose significance cannot be overstated. In the past, Japanese companies have dominated the photoresist market, with firms like JSR, Shin-Etsu Chemical, and Tokyo Ohka Kogyo (TOK) virtually monopolizing the high-end segment. In 2019, Japan imposed export restrictions on key semiconductor materials, including photoresist, to South Korea, which posed a severe "strangulation" crisis for South Korea's semiconductor industry.
Faced with external pressures, South Korea accelerated the domestic production of core semiconductor materials. SK Hynix, one of the leading companies in South Korea's semiconductor industry, actively sought breakthroughs. Despite previous reports that South Korea had resolved the EUV photoresist issue, this was merely a temporary measure by Japanese companies to continue supplying through overseas subsidiaries, and South Korean companies remained highly dependent on Japanese supplies.
To truly achieve self-reliance, SK Hynix collaborated with Dongjin Semichem, a South Korean company, to develop domestic EUV photoresist. The goal of their cooperation was not only to replace Japanese EUV photoresist but also to surpass it in performance, especially in terms of photosensitivity. The stronger the photosensitivity of the photoresist, the shorter the required exposure time, and the higher the production efficiency.
SK Hynix has made significant progress in the domestic production of EUV photoresist. In 2023, SK Hynix successfully achieved domestic production of EUV photoresist, shifting from import dependency to self-sufficiency. This milestone marked an important step for South Korea in the field of key semiconductor materials, reducing reliance on external supplies and enhancing supply chain stability.
Moreover, SK Hynix continues to explore new materials and technologies to improve photoresist performance. For example, SK Hynix plans to use Inpria's next-generation Metal Oxide Resist (MOR) in its sixth-generation (1c process, approximately 10nm) DRAM production, which will be the first large-scale application of MOR in DRAM manufacturing. This new type of photoresist is expected to further increase production efficiency and product performance.
As memory chip manufacturing processes continue to approach smaller nanometer scales, the application of EUV lithography technology is becoming increasingly widespread. SK Hynix first introduced EUV technology for 1anm (fourth-generation 10nm) DRAM production in 2021 and has been expanding the application of EUV technology. In 2025, SK Hynix took the lead in introducing ASML's High Numerical Aperture (High NA) EUV lithography system for the production of next-generation DRAM. This advanced lithography system can achieve higher precision and density, helping SK Hynix maintain a leading position in the fiercely competitive global semiconductor market.
SK Hynix's domestic production of EUV photoresist is not only aimed at addressing current supply chain risks but also at gaining the initiative in future technological competition. By collaborating with domestic companies and continuously innovating, SK Hynix is expected to further consolidate its position in the global semiconductor market and drive the continuous development of South Korea's semiconductor industry.
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